Issues »  Volume 39, Issue 3

Mass Transfer in Nanosize Layers of Transition Metals Under the Influence of Ion–Plasma Processing

A. K. Orlov, I. O. Kruhlov, I. E. Kotenko, S. I. Sidorenko, S. M. Voloshko

National Technical University of Ukraine ‘KPI’, 37 Peremohy Ave., 03056 Kyiv, Ukraine

Received: 21.02.2017. Download: PDF

The features of mass transfer of components in the Ni–Cu–Cr system with layers of nanometre thickness because of ion–plasma processing of different duration are investigated. The observed surface segregation of Cu and Cr atoms is associated with the generation of radiation defects and manifestation of the inverse Kirkendall effect. The possibilities of developing a new effective method of ion–plasma control of the reactivity of nanoscale layers of transition metals used to form the topology of micro- and nanoelectronic devices and protect them from corrosion are discussed.

Key words: nanoscale layers, mass transfer, ion–plasma processing, surface segregation, radiation defects, corrosion.

URL: http://mfint.imp.kiev.ua/en/abstract/v39/i03/0349.html

DOI: https://doi.org/10.15407/mfint.39.03.0349

PACS: 61.72.up, 61.80.Jh, 68.37.Hk, 81.15.Jj, 81.40.Wx, 81.65.-b, 81.70.Jb

Citation: A. K. Orlov, I. O. Kruhlov, I. E. Kotenko, S. I. Sidorenko, and S. M. Voloshko, Mass Transfer in Nanosize Layers of Transition Metals Under the Influence of Ion–Plasma Processing, Metallofiz. Noveishie Tekhnol., 39, No. 3: 349—361 (2017) (in Ukrainian)

REFERENCES
  1. K. K. Kadyrzhanov, F. F. Komarov, A. D. Pogrebnyak, V. S. Rusakov, and T. E. Turkebaev, Ionno-Luchevaya i Ionno-Plazmennaya Modifikatsiya Materialov [Ion–Beam and Ion–Plasma Modification of Materials] (Moscow: MGU: 2005) (in Russian).
  2. I. Utke, S. Moshkalev, and P. Russell, Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications (Oxford: Oxford University Press: 2012).
  3. K. Jun, J. Joo, and J. M. Jacobson, J. Vac. Sci. Technol. B: Nanotechnol. Microelectron.: Mater., Process., Meas., Phenom., 27, No. 6: 3043 (2009). Crossref
  4. C. A. Sanford, L. Stern, L. Barriss, L. Farkas, M. DiManna, R. Mello, D. J. Maas, and P. F. A. Alkemade, J. Vac. Sci. Technol. B: Nanotechnol. Microelectron.: Mater., Process., Meas., Phenom., 27, No. 6: 2660 (2009). Crossref
  5. O. D. Roshchupkina, J. Grenzer, T. Strache, J. McCord, M. Fritzsche, A. Muecklich, and J. Fassbender, J. Appl. Phys., 112, No. 3: 033901 (2012). Crossref
  6. V. I. Farenik, Fizicheskaya Inzheneriya Poverkhnosti, 3, Nos. 1–2: 4 (2005) (in Russian).
  7. S. Zuccon, E. Napolitani, E. Tessarolo, P. Zuppella, A. J. Corso, F. Gerlin, and M. G. Pelizzo, Optical Materials Express, 5, No. 6: 176 (2015). Crossref
  8. R. Steinberger, J. Walter, T. Greunz, J. Duchoslav, M. Arndt, S. Molodtsov, and D. Stifter, Corros. Sci., 99: 66 (2015). Crossref
  9. Y. Nagai, C. Nishimura, and T. Toshima, J. Vac. Sci. Technol, 3, No. 6: 2147 (1985). Crossref
  10. H. Windischmann, J. Appl. Phys., 62, No. 5: 1800 (1987). Crossref
  11. K. Zhang, M. Wen, G. Cheng, X. Li, Q. N. Meng, J. S. Lian, and W. T. Zheng, Vacuum, 99: 233 (2014). Crossref
  12. I. Sh. Abdullin, V. S. Zheltukhin, I. R. Sagbiev, and M. F. Shaekhov, Modifikatsiya Nanosloev v Vysokochastotnoy Plazme Ponizhennogo Davleniya [Modification of Nanolayers in High-Frequency Low-Pressure Plasma] (Kazan: Kazan. Gos. Tekhnol. Univ.: 2007) (in Russian).
  13. P. S. Goohpattader, N. Dwivedi, E. Rismani-Yazdi, N. Satyanarayana, R. J. Yeo, S. Kundu, and C. S. Bhatia, Tribology International, 81: 73 (2015). Crossref
  14. A. I. Kalinichenko, S. S. Perepelkin, and V. E. Strel'nitskiy, Voprosy Atomnoy Nauki i Tekhniki, 6, No. 101: 116 (2007) (in Russian).
  15. A. I. Stogniy, S. V. Koryakin, and V. A. Virchenko, Zh. Tekh. Fiz., 71, No. 6: 87 (2001) (in Russian).
  16. A. J. R. van den Boogaard, E. Zoethout, I. A. Makhotkin, E. Louis, and F. Bijkerk, J. Appl. Phys., 112, No. 12: 123502 (2012). Crossref
  17. M. Park, S. Baek, S. Kim, and S. E. Kim, Appl. Surf. Sci., 324: 168 (2015). Crossref
  18. L. N. Larikov, N. V. Dubovitskaya, S. M. Zakharov, and S. P. Chenakin, Uskorenie Diffuzii v Tverdom Tele Pri Vzaimodeystvii s Plazmoy [Acceleration of Diffusion in Solids Interacting with Plasma] (Minsk: MRTI: 1978) (in Russian).
  19. A. L. Pivovarov, S. P. Chenakin, and V. T. Cherepin, K Voprosu o Modeli Uskorennogo Massoperenosa v Usloviyakh Ionno-Plazmennogo Nasyshcheniya Tverdykh Tel [On the Question About the Model of Accelerated Mass Transfer in the Conditions of Ion–Plasma Saturation of Solids] (Donetsk: 1991) (Preprint/AN Ukr.SSR, Donetsk Fiz.-Tekhn. Inst., 1991) (in Russian).
  20. V. Yu. Nosenko, A. L. Pivovarov, S. P. Chenakin, and V. T. Cherepin, Metallofizika, 14, No. 2: 86 (1992) (in Russian).
  21. V. Yu. Nosenko, A. L. Pivovarov, and S. P. Chenakin, Poverkhnost'. Fizika, Khimiya, Mekhanika, 11: 83 (1992) (in Russian).
  22. V. T. Cherepin, Ionnyy Mikrozondovyy Analiz [Ion Microprobe Analysis] (Kiev: Naukova Dumka: 1992) (in Russian).
  23. V. V. Perinskiy and I. V. Perinskaya, Tekhnologiya Metallov, No. 11: 31 (2008) (in Russian).
  24. A. D. Marwick, J. Phys. F: Metal Phys., 8, No. 9: 1849 (1978). Crossref
  25. S. I. Sidorenko, M. O. Vasyliev, and S. M. Voloshko, Difuziya v Metalevykh Plivkakh z Mikro- ta Nanorozmirnoyu Strukturoyu [Diffusion in Metal Films with Micro- and Nanosize Structure] (Kyiv: Naukova Dumka: 2011) (in Ukrainian).
  26. M. Vasylyev, M. M. Nishenko, S. I. Sidorenko, and S. M. Voloshko, Defect and Diffusion Forum, 272: 31 (2007). Crossref
  27. M. T. Nichols, K. Mavrakakis, Q. Lin, and J. L. Shohet, J. Appl. Phys., 114, No. 10: 104107 (2013). Crossref
  28. V. T. Cherepin, M. A. Vasiliev, and Yu. N. Ivashchenko, DAN SSSR, 210, No. 4: 821 (1973) (in Russian).
  29. M. A. Vasiliev, A. B. Goncharenko, S. P. Chenakin, and V. T. Cherepin, Metallofizika, 2, No. 5: 114 (1980) (in Russian).

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