Influence of Annealing in Vacuum on Dispersion of Chromium Nanofilms Deposited onto Oxide Materials
І. І. Gab, Т. V. Stetsyuk, B. D. Kоstyuk, Yu. V. Naidich
I. M. Frantsevich Institute for Problems in Materials Science, NAS of Ukraine, 3 Academician Krzhyzhanovsky Str., UA-03142 Kyiv, Ukraine
Received: 20.02.2019. Download: PDF
The behaviour of nickel nanofilms 150 nm thickness deposited onto alumina ceramics, leucosapphire and zirconia ceramics and annealed in vacuum at temperatures up to 1100°C for different times (5–20 min) at each temperature was studied. As found, the films onto all oxides after annealing at temperatures up to 1000°C behave identically and preserve their integrity predominantly. With an increase in the annealing temperature up to 1100°С, the film begins to disperse intensively. The kinetic curves of films decomposition on all oxides are constructed depending on the annealing temperature and the exposure time at each temperature.
Key words: kinetics, disintegration, nickel nanofilm, annealing, oxide material.
PACS: 68.35.-p, 68.47.Gh, 68.55.-a, 81.40.Ef
Citation: І. І. Gab, Т. V. Stetsyuk, B. D. Kоstyuk, and Yu. V. Naidich, Influence of Annealing in Vacuum on Dispersion of Chromium Nanofilms Deposited onto Oxide Materials, Metallofiz. Noveishie Tekhnol., 41, No. 12: 1575—1585 (2019) (in Ukrainian)