Issues »  Volume 48, Issue 7

Relationship between Structural Characteristics and Physical-Mechanical Properties of Hafnium-Diboride Films Deposited by RF Magnetron Sputtering

O. A. Goncharov$^{1}$, A. M. Yunda$^{2}$, I. S. Kolinko$^{1}$, S. A. Goncharova$^{1}$

$^{1}$Sumy State University, 116 Kharkivs’ka Str., UA-40007 Sumy, Ukraine
$^{2}$Institute of Applied Physics, N.A.S. of Ukraine, 58 Petropavlivska Str., 40000 Sumy, Ukraine

Received: 10.02.2025; final version - 02.07.2025. Download: PDF

A comparative analysis of the structure and physical-mechanical characteristics of hafnium-diboride films synthesized by means of RF magnetron sputtering system is performed. As shown, changing the design features of the magnetron sputtering system (MSS) changes the structure formation parameters and, accordingly, the properties of the synthesized films. Two series of samples are obtained: before and after making changes to the MSS design. In the first series of experiments, films with the growth texture of the (00.1) plane are formed at a positive bias potential applied to the substrate, have a strong growth texture and high physical-mechanical characteristics: nanohardness of 41 GPa and elastic modulus of 396 GPa. For the second series of samples, textured hafnium-diboride films with the most intense texture (00.1) are formed with a grounded-substrate holder, while the resulting films have the best physical-mechanical characteristics: nanohardness of 46 GPa and elastic modulus of 306 GPa. As shown, hafnium-diboride films with a strong growth texture normal to the (00.1) plane have the highest physical-mechanical properties, regardless of the deposition conditions during magnetron sputtering.

Key words: coatings, films, magnetron sputtering, nanohardness, modulus of elasticity.

URL: https://mfint.imp.kiev.ua/en/abstract/v48/i07/0689.html

DOI: https://doi.org/10.15407/mfint.48.07.0689

PACS: 62.20.de, 62.20.Qp, 68.55.jd, 68.55.jm, 68.55.Nq, 68.60.Bs, 81.15.Cd

Citation: O. A. Goncharov, A. M. Yunda, I. S. Kolinko, and S. A. Goncharova, Relationship between Structural Characteristics and Physical-Mechanical Properties of Hafnium-Diboride Films Deposited by RF Magnetron Sputtering, Metallofiz. Noveishie Tekhnol., 48, No. 7: 689–701 (2026)

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