The paper presents the results of experimental studies of the process of vacuum CVD synthesis of carbon nanostructures on substrates of Si, SiO$_{2}$/Si, Ti, with controlled addition of the plasma component of the working gases С$_{2}$Н$_{2}$ and СН$_{4}$ to the synthesis zone. In the physicochemical processes of the synthesis of the obtained nanostructures, the main role is played by the electronic component of the plasma, which reaches the substrate and recombination of ions with plasma electrons occurs on the substrate surface. The plasma component in the synthesis zone significantly changes the structure of nanocarbon phases, their ratio, and distribution over the substrate, which determines the properties of the resulting coatings. The effect of the plasma component of the working gases becomes significant when the proportion of plasma in the total amount of gas is about 1%. Wherein, regardless of the physical nature of the substrate, specific carbon nanostructures with a significant amount of polymeric carbon components are formed on it.