Development of a Highly-Efficient Cold-Cathode Ion Source for Ion Implantation
O. V. Kosulya$^{1}$, B. M. Romaniuk$^{1}$, O. S. Oberemok$^{1}$, V. A. Baturin$^{1}$, O. Yu. Roenko$^{2}$, S. O. Yeryomin$^{2}$, P. O. Litvinov$^{2}$
$^{1}$V. Ye. Lashkaryov Institute of Semiconductor Physics, N.A.S. of Ukraine, 41 Nauky Prosp., UA-03028 Kyiv, Ukraine
$^{2}$Institute of Applied Physics, N.A.S. of Ukraine, 58 Petropavlivska Str., UA-40000 Sumy, Ukraine
Received: 09.10.2024; final version - 04.06.2025. Download: PDF
This article describes the design of a highly-efficient ion source with a Penning-system cold cathode for ion implantation. The ion source is intended for receiving large currents (> 10 μA) from solid materials whose boiling point is higher than the melting point. The ion source on the BALZERS MPB-202 ion implanter is also tested.
Key words: ion implantation, ion source, ion implanter, metal ions, semiconductor structures.
URL: https://mfint.imp.kiev.ua/en/abstract/v47/i06/0575.html
DOI: https://doi.org/10.15407/mfint.47.06.0575
PACS: 29.20.Ej, 29.25.Lg, 29.25.Ni, 29.27.Ac, 41.75.Ak, 41.75.Cn, 61.72.U-
Citation: O. V. Kosulya, B. M. Romaniuk, O. S. Oberemok, V. A. Baturin, O. Yu. Roenko, S. O. Yeryomin, and P. O. Litvinov, Development of a Highly-Efficient Cold-Cathode Ion Source for Ion Implantation, Metallofiz. Noveishie Tekhnol., 47, No. 6: 575—580 (2025)