Issues »  Volume 37, Issue 4

Formation of Nanostructured Relief of TiN—Fe Heterostructures in Hybrid Helicon-Arc Plasma Reactor

E. M. Rudenko$^{1}$, I. V. Korotash$^{1}$, D. Y. Polotskiy$^{1}$, L. S. Osipov$^{1}$, M. V. Dyakin$^{1}$, T. A. Prikhna$^{2}$, A. P. Shapovalov$^{2}$

$^{1}$G.V. Kurdyumov Institute for Metal Physics, NAS of Ukraine, 36 Academician Vernadsky Blvd., UA-03142 Kyiv, Ukraine
$^{2}$V. Bakul Institute for Superhard Materials, NAS of Ukraine, 2 Avtozavods’ka Str., UA-04074 Kyiv, Ukraine

Received: 19.12.2014. Download: PDF

The features of the physical mechanisms of controlled ion-plasma formation of the new functional nanomaterials are investigated. The technological regimes of formation of functional nanostructured materials under combined impact of several plasma sources are investigated; the structural and electrical properties of the obtained TiN films are studied. The structures of films are studied with scanning tunnelling microscope JSPM-4500/4610 interlocked with an atomic force microscope. As shown, the optimized helicon-arc reactor demonstrates the unique properties and provides controlled low-temperature formation of the dense regular TiN nanostructures with the sizes from a few to tens of nanometres.

Key words: TiN films, plasma, nanostructures, helicon-arc reactor.

URL: http://mfint.imp.kiev.ua/en/abstract/v37/i04/0499.html

DOI: https://doi.org/10.15407/mfint.37.04.0499

PACS: 52.50.Dg, 52.50.Qt, 61.46.Bc, 68.35.Ct, 68.35.Dv, 81.16.Rf, 82.33.Xj

Citation: E. M. Rudenko, I. V. Korotash, D. Y. Polotskiy, L. S. Osipov, M. V. Dyakin, T. A. Prikhna, and A. P. Shapovalov, Formation of Nanostructured Relief of TiN—Fe Heterostructures in Hybrid Helicon-Arc Plasma Reactor, Metallofiz. Noveishie Tekhnol., 37, No. 4: 499—508 (2015)

REFERENCES
  1. Carbon Nanotube Electronics (Eds. A. Javey and J. Kong) (New York: Springer: 2009).
  2. Carbon Nanotubes and Related Structures: Synthesis, Characterization, Functionalization, and Applications (Eds. D. M. Guldi and N. Martín) (Weinheim, Germany: Wiley-VCH: 2010).
  3. M. Meyyappan, L. Delzeit, A. Cassell, and D. Hash, Plasma Sources Sci. Technol., 12: 205 (2003). Crossref
  4. A. V. Melechko, V. I. Merkulov, T. E. McKnight, M. A. Guillorn, K. L. Klein, D. H. Lowndes, and M. L. Simpson, J. Appl. Phys., 97: 041301 (2005). Crossref
  5. M. S. Bell, K. B. K. Teo, and W. I. Milne, J. Phys. D: Appl. Phys., 40: 2285 (2007). Crossref
  6. M. E. Svavilnyj, Metallofiz. Noveishie Tekhnol., 32, No. 11: 1485 (2010) (in Russian).
  7. J. I. Sohn, Ch.-J. Choi, S. Lee, and T.-Ye. Seong, Appl. Phys. Lett., 78: 3130 (2001). Crossref
  8. V. F. Semenyuk, Eh. M. Rudenko, I. V. Korotash, L. S. Osipov, D. Yu. Polotskiy, K. P. Shamray, V. V. Odinokov, G. Ya. Pavlov, and V. A. Sologub, Metallofiz. Noveishie Tekhnol., 33, No. 2: 223 (2011) (in Russian).

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