The dependence of the thermoelectric power S(h$_{Cu}$) of multilayer composition Al—Cu on the Cu-layer thickness, h$_{Cu}$, is measured in range h$_{Cu}$ = (20—1200) nm. The temperature gradient is normal to plains of layers. When 1200 nm > hСu >> l$_{Cu}$ (l$_{Cu}$ $\leq$ (30—42) nm–electron free pass in Cu), the |S| $\cong$ 4 $\mu$V$\cdot$K$^{-1}$ is comparable with |S| of bimetals. When hСu < 100 nm, the layers impede to electron motion as superlattice.