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Issues »  Volume 38, Issue 3

Structural and X-Ray—Optical Characteristics of the W/Si Multilayer X-Ray Mirrors

Yu. P. Pershin1, A. Yu. Devizenko1, V. V. Kondratenko1, H. Modrow2, F.-J. Hormes3

1National Technical University ‘Kharkiv Polytechnic Institute’, 21 Frunze Str., 61002 Kharkiv, Ukraine
2Physikalisches Institut, Rheinische Friedrich-Wilhelms Universität Bonn, 12 Nuβallee, D-5315 Bundesrepublik, Deutschlan
3Canadian Light Source, University of Saskatchewan, 101 Premeter Road, SK S7NOX4 Saskatoon, Canada

Received: 13.01.2016. Download: PDF

By methods of X-ray diffraction in hard (λ= 0.154 nm) and soft (0.8 <λ< 2.4 nm) ranges, the structure and optical properties for series of W/Si multilayer X-ray mirrors (MXMs) with periods of 1—6 nm are studied. MXMs are deposited with DC magnetron sputtering. Mixed interlayers at MXM interfaces with composition close to WSi2 make the main contribution to a reduction of MXM reflectivity at soft X-rays (λ= 2.36 nm). A possibility to fabricate MXMs with resolution of at least 5 times better than standard W/Si MXM in the soft X-ray range is demonstrated.

Key words: multilayer X-ray mirror, soft X-rays, reflectivity, resolution, interface interaction, silicide.

URL: http://mfint.imp.kiev.ua/en/abstract/v38/i03/0367.html

DOI: https://doi.org/10.15407/mfint.38.03.0367

PACS: 07.85.Fv, 41.50.+h, 61.05.cf, 61.05.cm, 61.05.cp, 68.35.Fx, 78.67.Pt, 81.15.Cd

Citation: Yu. P. Pershin, A. Yu. Devizenko, V. V. Kondratenko, H. Modrow, and F.-J. Hormes, Structural and X-Ray—Optical Characteristics of the W/Si Multilayer X-Ray Mirrors, Metallofiz. Noveishie Tekhnol., 38, No. 3: 367—388 (2016) (in Russian)

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