Memristancy Effects in Solid-State Heterostructures
E. M. Rudenko$^{1}$, M. O. Bilogolovs’kyy$^{1}$, I. V. Korotash$^{1}$, D. Yu. Polots’kyy$^{1}$, A. O. Krakovnyy$^{1}$, O. S. Zhytlukhina$^{2}$
$^{1}$G.V. Kurdyumov Institute for Metal Physics, NAS of Ukraine, 36 Academician Vernadsky Blvd., UA-03680 Kyiv-142, Ukraine
$^{2}$Donetsk Institute for Physics and Engineering Named after O.O. Galkin, NAS of Ukraine, 46 Nauky Ave., UA-03680 Kyiv, Ukraine
Received: 23.06.2016. Download: PDF
Physical nature of hysteretic transport characteristics of two solid-state structures is discussed. For heterocontacts formed by a metal counter electrode with a complex transition-metal oxide, it is shown that two-valued current—voltage dependences appear due to the migration of the O vacancies under the influence of an external electric field whereas a memristancy-like behaviour of nanostructured carbon films is due to the presence of current-carrier traps. As found in the latter case, an extremely high conductivity state of carbon film is formed after several periods of the alternating current flowing through it. The experimentally discovered asymmetry of the current—voltage characteristics for carbon films opens up a possibility of their application as a base element of an integrated memristor circuit able to eliminate a parasitic link between the adjacent switching nodes.
Key words: memristor, current—voltage characteristics, hysteresis, oxygen vacancies, nanostructured carbon films.
URL: http://mfint.imp.kiev.ua/en/abstract/v38/i08/0995.html
DOI: https://doi.org/10.15407/mfint.38.08.0995
PACS: 61.72.Hh, 73.40.Ns, 74.72.-h, 74.78.Fk, 81.40.Rs, 84.32.Ff, 85.25.Hv
Citation: E. M. Rudenko, M. O. Bilogolovs’kyy, I. V. Korotash, D. Yu. Polots’kyy, A. O. Krakovnyy, and O. S. Zhytlukhina, Memristancy Effects in Solid-State Heterostructures, Metallofiz. Noveishie Tekhnol., 38, No. 8: 995—1008 (2016) (in Russian)