Adsorption Capacity of Metallic Thin Films after Bombarding by Low-Energy Ar$^{+}$ Ions

M. O. Vasylyev, S. I. Sidorenko, I. O. Kruhlov, D. I. Trubchaninova

National Technical University of Ukraine ‘Igor Sikorsky Kyiv Polytechnic Institute’, 37 Peremohy Ave., UA-03056 Kyiv, Ukraine

Received: 02.10.2019. Download: PDF

In this work, the sputtering kinetics of the adsorbed oxygen layers obtained on the surface of 100 nm thick Nb, Ti, Fe, Ni, and Cu metal films after their cleaning by Ar$^{+}$ ions with energy of 4 keV and a wide dose range is studied by the method of the secondary ion-ion emission. The changes of adsorption capacity of the surface after a long bombardment are established depending on the nature of the metals. The mechanism of the passivation effect of the film surface because of this treatment is proposed.

Key words: secondary ion-ion emission, thin films, ion bombardment, oxidation, adsorption.

URL: http://mfint.imp.kiev.ua/en/abstract/v42/i05/0621.html

DOI: https://doi.org/10.15407/mfint.42.05.0621

PACS: 52.40.Fd, 61.80.Lj, 68.49.Df, 68.35.Iv, 68.35.Np, 75.70.Rf

Citation: M. O. Vasylyev, S. I. Sidorenko, I. O. Kruhlov, and D. I. Trubchaninova, Adsorption Capacity of Metallic Thin Films after Bombarding by Low-Energy Ar$^{+}$ Ions, Metallofiz. Noveishie Tekhnol., 42, No. 5: 621—630 (2020) (in Ukrainian)


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