Issues »  Volume 42, Issue 6

Effect of Energy Factors on the Structure and Substructure Characteristics of Hafnium Diboride Films Deposited by RF Magnetron Sputtering

A. A. Goncharov$^{1}$, A. V. Zykov$^{2}$, A. N. Yunda$^{1}$, I. V. Shelest$^{1}$, V. V. Buranich$^{1}$

$^{1}$Sumy State University, 2 Rymsky-Korsakov Str., UA-40007 Sumy, Ukraine
$^{2}$V. N. Karazin Kharkiv National University, 4 Svobody Sqr., UA-61022 Kharkiv, Ukraine

Received: 04.09.2019; final version - 17.12.2019. Download: PDF

In this paper, the influence of energy factors, such as the bias potential, current density, deposition rate, on the formation of the structure and substructure of hafnium diboride films deposited using RF magnetron sputtering is analysed. As shown, the structural changes from a quasi-amorphous to a nanocrystalline state with a growth texture occur due to changes in energy factors.

Key words: magnetron sputtering, deposition conditions, structure, substructure, hafnium diboride film.

URL: http://mfint.imp.kiev.ua/en/abstract/v42/i06/0815.html

DOI: https://doi.org/10.15407/mfint.42.06.0815

PACS: 61.46.-w, 62.25.Mn, 68.55.jm, 68.55.Nq, 81.07.Bc, 81.15.Cd

Citation: A. A. Goncharov, A. V. Zykov, A. N. Yunda, I. V. Shelest, and V. V. Buranich, Effect of Energy Factors on the Structure and Substructure Characteristics of Hafnium Diboride Films Deposited by RF Magnetron Sputtering, Metallofiz. Noveishie Tekhnol., 42, No. 6: 815—827 (2020)

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