Formation and Structure of Al–Si Layer on Contact Surface of Aluminium–Reactive Flux of KF–AlF3–K2SiF6 System
O. M. Sabadash, S. V. Maksymova
E. O. Paton Electric Welding Institute, NAS of Ukraine, 11 Kazymyr Malevych Str., UA-03150 Kyiv, Ukraine
Received: 02.08.2019; final version - 07.05.2020. Download: PDF
When heating the reactive flux of the KF–AlF3–K2SiF6 system on an aluminium substrate, two processes occur; reduction of silicon from potassium hexafluorosilicate; contact-reactive melting of silicon with aluminium. As a result, an Al–Si alloy layer is formed on the reaction surface, the composition of which is close to hypereutectic, which is confirmed by the results of X-ray microanalysis. The microstructure of the crystallized Al–Si metal layer contains aluminium-based solid solution grains and a hypereutectic component with a silicon concentration (% wt.): 17.18 in intercrystalline areas, as well as individual discrete inclusions of the lamellar phase, which is close in stoichiometric composition to the compound FeSiAl5. Comparative experiments on a graphite substrate showed that the silicon content in the flux residues after heating corresponds to its content in the initial flux composition.
Key words: reactive flux of the KF–AlF3–K2SiF6 system, contact melting, silicon, aluminium, Al–Si metal layer.
URL: http://mfint.imp.kiev.ua/en/abstract/v42/i08/1079.html
DOI: https://doi.org/10.15407/mfint.42.08.1079
PACS: 61.20.Qg, 61.25.Mv, 61.66.Fn, 81.15.Lm, 82.45.Mp
Citation: O. M. Sabadash and S. V. Maksymova, Formation and Structure of Al–Si Layer on Contact Surface of Aluminium–Reactive Flux of KF–AlF3–K2SiF6 System, Metallofiz. Noveishie Tekhnol., 42, No. 8: 1079—1092 (2020) (in Ukrainian)